Photo mask protection film
TACKWELL
High Durability Tape - for Protection of Solder Resist
TACKWELL 157SD
157SD keeps the anti-adhesion layer intact, even under solvent attack, and allows you to easily peel off the mask, even against a liquid resist with strong tacking capability.
Some halogen-free liquid photo resists or those for packaging substrates contain special solvent.
This solvent removes the anti-adhesion layer from the photo mask protection film and, resultantly, earlier tape replacement is unavoidable.
The TACKWELL 157SD withstands such solvent attack to retain the anti-adhesion layer and extensively improve the durability of the tape. This minimizes the replacement of protection film while the liquid resist is being used. In addition, 157SD is superior in optical performance and provides the best solution for high-density packaging substrates such as BGA.
Study on elimination of anti-adhesion layer
Evaluation method
After the specified number of exposure cycles is provided, the load used to separate the photo mask (to which the protection film is adhered) and the substrate is measured.
Evaluation of photo mask haze
Evaluation method
After the specified number of exposure cycles is provided, the haze of the photo mask is measured.
Sekisui's evaluation method (adhesion and exposure evaluation method)
The substrate is exposed to UV repeatedly under the actual conditions to evaluate the adhesion.
| Resist | AUS308 of Taiyo Ink Mfg. |
|---|---|
| Substrate | 0.8mm thick glass epoxy substrate with both faces coated with 35-um thick |
| Vacuum adhesion | 75 cmHg x 1 min |
- The above figures are only measurements; their values are not guaranteed
High Durability Type (Antistatic function+Release layer)
TACKWELL 157ASD
TACKWELL 157ASD is the tape with a highly durable and antistatic layer that newly added on the highly durable release layer of TACKWELL 157SD. In addition, another new funcion -a bubble-suppressing funcion- is added to prevent bubbles from forming by lamination.
Antistatic function
Bubble-suppresive function during a lamination process
| Photomask | Kodak-made SO-404 |
|---|---|
| L/S= | 30/30μ |
| Lamination speed | 1m/min |
| Lamination direction | From left toward right in the picture |
